CRYSTAR® silicon carbide offers superior strength and versatility for shaping single wafer processing components.
CRYSTAR works closely with many major OEM's to develop a wide range of products for single wafer processes such as etch (metal, dielectric, oxide), CVD, PVD, RTP and chemical processing. These applications require the most stringent yield performance. The high purity of CRYSTAR SiC products along with our SiC CVD coatings expertise and unique forming capability, provide materials exhibiting excellent resistance to such SWP processing environments as Wet Chemical (HF, HCl, H2SO4, etc.) and F- and Cl- based Plasmas. These characteristics of CRYSTAR silicon carbide materials make them an excellent choice for single wafer processing applications.